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                 试验与研究                                                              DOI:10.11973/lhjy-wl230376


                      X 射线光电子能谱测试参数对 CaF 氧元素含量
                                                                                 2
                                                测试结果的影响




                                                             2
                                                   1,2
                                             侯 瑶 ，崔 云 ，陶春先 ，冯殿福               1,2
                                                                     1
                 （1.上海理工大学 光电信息与计算机工程学院，上海 200093；2.中国科学院 上海光学精密机械研究所，上海 201800）
                      摘  要：针对在X射线光电子能谱刻蚀剖析过程中出现测试结果失真的问题，以CaF 2 试样为研究
                  对象，通过改变离子束能量、刻蚀后停顿时间、氧元素的精细谱扫描顺序等参数，对试样表面氧元素含
                  量的测试结果进行分析，同时使用SRIM软件模拟计算氩离子束刻蚀CaF 2 产生的空位缺陷，为测试失
                  真分析提供数据支持。结果表明：在CaF 2 表面测得氧元素的原因为试样表面吸附残余气体中的羟基和
                  O 2 ；通过优化X射线光电子能谱测试参数，有效去除了表面的羟基和吸附的O 2 ，削弱或者消除了残余气
                  体对测试结果的影响；材料的极性分子和低表面结合能是离子刻蚀过程中表面快速吸附残余气体的主
                  要原因。研究结果对使用X射线光电子能谱准确表征具有极性分子材料的元素成分具有重要指导意义。
                      关键词： X射线光电子能谱；刻蚀深度剖析；表面吸附；表面分析技术；SRIM软件
                      中图分类号：TH838      文献标志码：A    文章编号：1001-4012(2025)03-0025-07
                 The influence of X-ray photoelectron spectroscopy test parameters on the test

                                             results of CaF  oxygen content
                                                             2
                                         HOU Yao , CUI Yun , TAO Chunxian , FENG Dianfu 1,2
                                                         2
                                                                      1
                                                1,2
               (1.School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;
                       2.Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China)
                       Abstract: Aiming at the problem of distortion of test results in the process of X-ray photoelectron spectroscopy
                  etching analysis, the CaF 2  sample was taken as the research object. The test results of oxygen content on the surface of the
                  sample were analyzed by changing the parameters such as ion beam energy, pause time after etching, and fine spectrum
                  scanning sequence of oxygen elements. At the same time, SRIM software was used to simulate the vacancy defects
                  generated by argon ion beam etching of CaF 2 , which provided data support for test distortion analysis. The results show
                  that the oxygen element measured on the surface of CaF 2  was due to the adsorption of hydroxyl and O 2  in the residual gas
                  on the surface of the sample. By optimizing the X-ray photoelectron spectroscopy test parameters, the surface hydroxyl
                  and adsorbed O 2  could be effectively removed, and the influence of residual gas on the test results could be weakened
                  or eliminated. The polar molecules and low surface binding energy of the material were the main reasons for the rapid
                  adsorption of residual gas on the surface during ion etching. The research results had important guiding significance for the

                  accurate characterization of the elemental composition of polar molecular materials by X-ray photoelectron spectroscopy.
                       Keywords:  X-ray  photoelectron  spectroscopy;  etching  depth  analysis;  surface  adsorption;  surface  analysis
                  technology; SRIM software




                 收稿日期：2023-12-27                                     CaF 2 晶体是一种重要的光学材料，在一定的光
                                                                                     [1]
                 基金项目：上海理工大学专业学位研究生实践基地项目（23-24-                谱范围（0.125~10 μm） 内具有色散小、透过率高、
              302-001） ；中国科学院功能晶体与激光技术重点实验室开放课题                 折射率低和激光损伤阈值高等优点 ，广泛应用于
                                                                                                 [2]
             （FCLT202303）
                                                                红外检测系统、准分子激光器、太阳能电池 以及高
                                                                                                       [3]
                 作者简介：侯 瑶（2000-） ，女，硕士研究生，主要从事红外微结
              构方面的研究                                            功率激光窗口中，尤其在深紫外波段（DUV），CaF 2
                                                                                              [4]
                 通信作者：崔 云（1978- ），cuiyun@siom.ac.cn             是极紫外光刻系统中的重要材料 。
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