The Effect of Annealing Time on Microstructure and Properties of Al/PbTe Films Deposited by Magnetron Sputtering

The Al/PbTe films were prepared by RF magnetron sputtering and annealed in the vacuum resistance furnace. SEM and X-ray diffraction (XRD) were used to characterize the surface morphology and phase compositions respectively, and their transmittance and resistivity were also studied. The results show that the Al/PbTe film had obvious 〈100〉 direction optimizing orientation. As the extension of annealing time, the intensity of PbTe (200) diffraction peak reduced markedly and PbTe(111)diffraction peak appeared. After annealing, some flower shape gathers appeared on the surfaces of the film, and with the extension of time, the flower shape gathers became more and more intensive and evenly. FTIR analysis showed that after annealing the absorption bands had a little migration to the short wave direction, and both the transmissivity and resistivity of the film tended to decrease firstly and then increase as the extension of annealing time.