INFLUENCE OF PLASMA NITRIDING TECHNICS PARAMETER ON THE SUBSTRATE OF TC4 MODIFIED LAYER THICKNESS

A plasma nitriding process with a pure Ti cathode aided was employed on the substrate of TC4. The influence of parameters such as substrate temperature,gas medium and incubation time to the properties of plasma nitriding was studied. Microstructure and composition of the modified layer was analyzed using Zxiovert 25CA (Zeiss) and spectro GDA750 Discharge optical emission spectrometer. Result shows that during plasma nitriding process the substrate temperature is the more important than other parameters,and the modified layer can effectively improve the micro-hardness of the substrate.