Sample Preparation Methods of Metallographic Examination for Hafnium Sputtering Target

The more effective method for mechanical and chemical polishing was chose through the comparison of different polishing methods for hafnium sputtering target, then the effect was validated by erosion. The results showed that polishing with the solution (HF+HNO3+H2O+OPS+H2O2) and the less pressure was the better method of preparation for metallographic examination for hafnium. And it could provide condition for microstructure analysis.