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    HE Xiao-chun, LI Jia-bao. ON THE ERRORS FORMULA FOR X-RAY STRESS MEASUREMENT USING SIMULATED DIFFRACTION PROFILES[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART A:PHYSICAL TESTING, 2006, 42(3): 125-128.
    Citation: HE Xiao-chun, LI Jia-bao. ON THE ERRORS FORMULA FOR X-RAY STRESS MEASUREMENT USING SIMULATED DIFFRACTION PROFILES[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART A:PHYSICAL TESTING, 2006, 42(3): 125-128.

    ON THE ERRORS FORMULA FOR X-RAY STRESS MEASUREMENT USING SIMULATED DIFFRACTION PROFILES

    • Simulated X-ray diffraction profiles are used to calculate the peak position errors and residual stress errors in X-ray residual stress measurement respectively. The dependences of the errors on half width (HW), peak intensity of line-less-background (IP) and the ratio of peak intensity of line-less-background to background intensity (IP/IB) are analyzed to deduce the errors formula for the peak position and residual stress, which are validated by the measured X-ray diffraction profiles.
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