X射线反射法测量铋系超导薄膜的结构参数
Structure Parameter of Bi Superconducting Thin Film Using X-Ray Reflectivity
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摘要: 以铋系超导薄膜材料为例,应用X射线反射法测量薄膜材料的厚度以及粗糙度等结构参数,对测量方法的原理、衍射仪的调试和步骤等进行了详细的说明。这一方法为薄膜材料结构参数的测量提供了新途径。Abstract: The method to measure the thickness and toughness of Bi superconducting thin film by X-ray reflectivity was studied. The principle of measurement and the setting steps of X-ray diffractometer were detailed introduced. This is a new method to study the properties of thin film.